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Physical / Chemical Vapour Deposition (PVD/ CVD)

(Kopie 3)

With Physical Vapour Deposition (PVD), metal and plastic components are coated with a very thin material layer (1-5 µm). Here the coating material is condensed on the component, and therefore the coating material must be vaporised in advance. In order to prevent a reaction with the atmosphere, the process is carried out within a vacuum It is possible to select between single or multi-layer coatings. Coatings made from reaction products from fed gases and the vaporised material are also possible (carbide, oxide, nitride). Through the selective choosing of the coating composition, the properties can be adjusted in a targeted manner (electrical conductivity, wear resistance, hardness etc.).

With CVD (Chemical Vapour Deposition), on the other hand, the material to be deposited is not condensed, but instead reacts with the heated substrate from the gas phase in order to form a coating.


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