UHV Spectroscopy I (422N)

(Kopie 3)

The 422 Laboratory has X-ray photoelectron
spectroscopy (XPS), Metastable Induced Electron Spectroscopy (MIES) in combination with ultraviolet photoelectron spectroscopy (UPS) and thermal desorption spectroscopy (TPD). The system is under an ultra high vacuum with a basic pressure of 1.10-10 mbar. Conductive samples measuring 0.8 cm² and with a thickness of up to 2mm can be examined. For cleaning, there is the option of heating the substrate up to a temperature of 1300K. For in-situ preparation, there is also a gas inlet system, an organic vaporiser and an alkali vaporiser available.




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